Invention Grant
- Patent Title: Systems and methods for metrology with layer-specific illumination spectra
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Application No.: US15608766Application Date: 2017-05-30
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Publication No.: US10444161B2Publication Date: 2019-10-15
- Inventor: Amnon Manassen , Daria Negri , Andrew V. Hill , Ohad Bachar , Vladimir Levinski , Yuri Paskover
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz PC LLO
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01B11/27 ; G01N21/33 ; G01N21/3563 ; G01N21/95 ; G01N21/84 ; G03F7/20 ; G01B11/06

Abstract:
A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.
Public/Granted literature
- US20180292326A1 Systems and Methods for Metrology with Layer-Specific Illumination Spectra Public/Granted day:2018-10-11
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