Invention Grant
- Patent Title: Optical system and method
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Application No.: US16060195Application Date: 2016-12-01
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Publication No.: US10444637B2Publication Date: 2019-10-15
- Inventor: Johannes Jacobus Matheus Baselmans
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Priority: EP15201057 20151218
- International Application: PCT/EP2016/079396 WO 20161201
- International Announcement: WO2017/102350 WO 20170622
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B27/48

Abstract:
An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane.
Public/Granted literature
- US20180364587A1 OPTICAL SYSTEM AND METHOD Public/Granted day:2018-12-20
Information query
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