Invention Grant
- Patent Title: Metrology apparatus, lithographic system, and method of measuring a structure
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Application No.: US16159080Application Date: 2018-10-12
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Publication No.: US10444640B2Publication Date: 2019-10-15
- Inventor: Janneke Ravensbergen , Duygu Akbulut , Nitesh Pandey , Jin Lian
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP17196670 20171016
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03F7/20 ; G01B9/02

Abstract:
A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
Public/Granted literature
- US20190113852A1 METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM, AND METHOD OF MEASURING A STRUCTURE Public/Granted day:2019-04-18
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