Invention Grant
- Patent Title: Vapor deposition apparatus including a blocking gas flow generation unit
-
Application No.: US15205815Application Date: 2016-07-08
-
Publication No.: US10446753B2Publication Date: 2019-10-15
- Inventor: Jin-Kwang Kim , Seung-Yong Song , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jae-Hyun Kim , Sung-Chul Kim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0131114 20121119
- Main IPC: C23C16/44
- IPC: C23C16/44 ; H01L51/00 ; H01B13/30 ; C23C14/24 ; C23C14/56 ; C23C16/455 ; C23C16/50 ; H01L51/52 ; H01L51/56 ; H01L27/32
Abstract:
A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.
Public/Granted literature
- US20160322574A1 VAPOR DEPOSITION APPARATUS Public/Granted day:2016-11-03
Information query
IPC分类:
