Invention Grant
- Patent Title: Substrate table, immersion lithographic apparatus and device manufacturing method
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Application No.: US15490598Application Date: 2017-04-18
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Publication No.: US10451980B2Publication Date: 2019-10-22
- Inventor: Marco Koert Stavenga , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/68 ; H01L21/687

Abstract:
A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
Public/Granted literature
- US20170219936A1 SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2017-08-03
Information query
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