Invention Grant
- Patent Title: Inspection method, inspection apparatus and illumination method and apparatus
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Application No.: US15453049Application Date: 2017-03-08
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Publication No.: US10459347B2Publication Date: 2019-10-29
- Inventor: Dirk Ewoud Boonzajer Flaes , Stefan Michiel Witte , Kjeld Sijbrand Eduard Eikema
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP16160277 20160315
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B11/00 ; G01N21/47 ; G01N21/956 ; G02B21/16 ; H05G2/00

Abstract:
In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.
Public/Granted literature
- US20170269482A1 Inspection Method, Inspection Apparatus and Illumination Method and Apparatus Public/Granted day:2017-09-21
Information query
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