A compound semiconductor field effect transistor (FET) may include gallium nitride (GaN) and alloy material layers. The compound semiconductor FET may also include a pair of L-shaped contacts on the GaN and alloy material layers. The compound semiconductor FET may also include a pair of gate spacers between the L-shaped contacts and on the GaN and alloy material layers, each of the pair of gate spacers contacting one of the L-shaped contacts. The compound semiconductor FET may further include a base gate between the pair of gate spacers and on the GaN and alloy material layers, in which the pair of L-shaped contacts are self-aligned with the base gate.