- 专利标题： Method for depositing protection film of light-emitting element
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申请号： US16189452申请日： 2018-11-13
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公开(公告)号： US10461282B2公开(公告)日： 2019-10-29
- 发明人: Hong-Jae Lee , Jong-Hwan Kim , Woo-Pil Shim , Woo-Jin Lee , Sung-Yean Yoon , Don-Hee Lee
- 申请人： TES CO., LTD
- 申请人地址： KR Yongin, Gyeonggi-do
- 专利权人： TES CO., LTD
- 当前专利权人： TES CO., LTD
- 当前专利权人地址： KR Yongin, Gyeonggi-do
- 代理机构： Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- 代理商 Kongsik Kim; Jhongwoo Jay Peck
- 优先权： KR10-2016-0059944 20160517
- 主分类号： H01L51/40
- IPC分类号： H01L51/40 ; H01L51/56 ; H01L51/52 ; H01L21/02
摘要：
The present invention relates to a method of depositing a protection film for a light-emitting element, the method comprising the steps of: depositing a first inorganic protection layer on a light-emitting element on a substrate; and depositing a second inorganic protection layer, having comparatively smaller internal stress than the first inorganic protection layer, on the first inorganic protection layer.
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