Invention Grant
- Patent Title: Exposure method in panoramic photo shooting and apparatus
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Application No.: US15546959Application Date: 2015-01-27
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Publication No.: US10462376B2Publication Date: 2019-10-29
- Inventor: Yong Wang , Yujie Chen , Lin Yang
- Applicant: Huawei Technologies Co., Ltd.
- Applicant Address: CN Shenzhen
- Assignee: HUAWEI TECHNOLOGIES CO., LTD.
- Current Assignee: HUAWEI TECHNOLOGIES CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: Conley Rose, P.C.
- International Application: PCT/CN2015/071649 WO 20150127
- International Announcement: WO2016/119126 WO 20160804
- Main IPC: H04N5/235
- IPC: H04N5/235 ; H04N5/232 ; G03B37/02 ; H04N5/243

Abstract:
An exposure method in panoramic photo shooting to resolve a problem that luminance of a composite picture in panoramic photo shooting is not smooth, where the method includes obtaining, by a terminal device, luminance values respectively corresponding to M pictures shot in advance and a luminance value of a current environment in which shooting is to be performed, where M is a positive integer, obtaining, by the terminal device by means of calculation according to the luminance values respectively corresponding to the M pictures shot in advance and the luminance value of the current environment in which shooting is to be performed, a luminance value of a picture to be shot, and performing, by the terminal device, exposure according to the luminance value of the picture to be shot.
Public/Granted literature
- US20180020141A1 Exposure Method in Panoramic Photo Shooting and Apparatus Public/Granted day:2018-01-18
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