Invention Grant
- Patent Title: Gas production apparatus
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Application No.: US14865334Application Date: 2015-09-25
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Publication No.: US10465299B2Publication Date: 2019-11-05
- Inventor: Kohei Higashi
- Applicant: FUJIFILM Corporation , Japan Technological Research Association of Articifial Photosynthetic Chemical Process
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: FUJIFILM Corporation,JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS
- Current Assignee: FUJIFILM Corporation,JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2013-068939 20130328
- Main IPC: C25B1/02
- IPC: C25B1/02 ; C25B1/00 ; C25B11/04 ; H01L31/05 ; H01L31/0749 ; H01L31/046 ; C25B1/10 ; H01L31/072

Abstract:
A gas production apparatus is provided which includes: a module including a plurality of PN junctions connected in series to one another, each being formed of an inorganic semiconductor and having a light receiving surface; two gas generators that are provided at open ends of PN junctions at both extremities of the module, respectively, on a side of the light receiving surface; an electrolysis chamber which contains an aqueous electrolytic solution in contact with the two gas generators and contains gases generated by the two gas generators; and a diaphragm which is ion-permeable but gas-impermeable, and partitions the electrolysis chamber into two regions including the two gas generators, respectively, and containing hydrogen and oxygen, respectively.
Public/Granted literature
- US20160010218A1 GAS PRODUCTION APPARATUS Public/Granted day:2016-01-14
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