Invention Grant
- Patent Title: Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method
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Application No.: US15841811Application Date: 2017-12-14
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Publication No.: US10474043B2Publication Date: 2019-11-12
- Inventor: Patrick Warnaar , Maurits Van Der Schaar , Grzegorz Grzela , Erik Johan Koop , Victor Emanuel Calado , Si-Han Zeng
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP16204764 20161216
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/47

Abstract:
A method of measuring a property of a substrate, the substrate having a plurality of targets formed thereon, the method comprising: measuring N targets of the plurality of targets using an optical measurement system, where N is an integer greater than 2 and each of said N targets is measured Wt times, where Wt is an integer greater than 2 so as to obtain N*Wt measurement values; and determining R property values using Q equations and the N*Wt measurement values, where R
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