Invention Grant
- Patent Title: Gas separation membrane, gas separation module, gas separation apparatus, and gas separation method
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Application No.: US15679159Application Date: 2017-08-17
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Publication No.: US10507437B2Publication Date: 2019-12-17
- Inventor: Satoshi Sano , Koji Hironaka , Keisuke Kodama
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JP2015-039092 20150227
- Main IPC: C08G77/20
- IPC: C08G77/20 ; C08G77/28 ; B01D71/70 ; B01D53/22 ; B01D69/12 ; B32B27/00 ; B01D61/36 ; B01D71/12 ; C10L3/10 ; B01D69/02 ; B01D69/10 ; C07C7/144 ; C08L1/12 ; C08L1/14 ; C09D183/06 ; B01D71/10 ; C01B32/55 ; B01D53/14 ; C07C9/04 ; C08B3/00 ; C08G77/04

Abstract:
A gas separation membrane has a gas separation layer containing a cellulose resin, and an organopolysiloxane compound layer disposed on the gas separation layer in which Si ratio of the organopolysiloxane compound layer after immersion in chloroform to the organopolysiloxane compound layer before immersion in chloroform, the Si ratio being calculated by Mathematical expression (I), is 0.6 to 1.0. Si ratio=(Si—Kα X-ray intensity after immersion in chloroform)/(Si—Kα X-ray intensity before immersion in chloroform) Mathematical expression (I)
Public/Granted literature
- US20180021741A1 GAS SEPARATION MEMBRANE, GAS SEPARATION MODULE, GAS SEPARATION APPARATUS, AND GAS SEPARATION METHOD Public/Granted day:2018-01-25
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