- Patent Title: Nanotransfer printing method and surface-enhanced raman scattering substrate, surface-enhanced raman scattering vial and surface-enhanced raman scattering patch manufactured using the same
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Application No.: US14884529Application Date: 2015-10-15
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Publication No.: US10507604B2Publication Date: 2019-12-17
- Inventor: Yeon Sik Jung , Jae Won Jeong , Kwang Min Baek , Jong Min Kim , Tae Won Nam
- Applicant: Korea Advanced Institute of Science and Technology
- Applicant Address: KR Daejeon
- Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee Address: KR Daejeon
- Agency: Marshall, Gerstein & Borun LLP
- Priority: KR10-2014-0148502 20141029; KR10-2014-0159159 20141114; KR10-2015-0129896 20150914
- Main IPC: B29C39/02
- IPC: B29C39/02 ; C23C14/04 ; B29L31/00
Abstract:
A nanotransfer printing method, including the steps of coating a polymer thin film on a template substrate where a surface pattern is formed, fabricating the polymer thin film into a thin-film replica mold by using the polymer thin film and an adhesive film, forming nanostructures on the thin-film replica mold, selectively weakening an adhesive force between the adhesive film and the thin-film replica mold, and transferring the nanostructures into a target object, is provided.
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