Invention Grant
- Patent Title: Measurement substrate and a measurement method
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Application No.: US15778061Application Date: 2016-11-23
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Publication No.: US10508896B2Publication Date: 2019-12-17
- Inventor: Stoyan Nihtianov , Ruud Hendrikus Martinus Johannes Bloks , Johannes Paul Marie De La Rosette , Thibault Simon Mathieu Laurent , Kofi Afolabi Anthony Makinwa , Patricius Jacobus Neefs , Johannes Petrus Martinus Bernardus Vermeulen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP15196359 20151125
- International Application: PCT/EP2016/078545 WO 20161123
- International Announcement: WO2017/089391 WO 20170601
- Main IPC: G01B7/00
- IPC: G01B7/00 ; G01B7/16 ; G03F7/20 ; H01L21/67 ; G01K7/01 ; H01L21/66

Abstract:
A measurement substrate for measuring a condition pertaining in an apparatus for processing production substrates during operation thereof, the measurement substrate including: a body having dimensions compatible with the apparatus; a plurality of sensor modules embedded in the body, each sensor module having: a sensor configured generate an analog measurement signal, an analog to digital converter to generate digital measurement information from the analog measurement signal, and a module controller configured to output the digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and to communicate the digital measurement information to an external device.
Public/Granted literature
- US20180340767A1 MEASUREMENT SUBSTRATE AND A MEASUREMENT METHOD Public/Granted day:2018-11-29
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