Invention Grant
- Patent Title: Methods of dry stripping boron-carbon films
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Application No.: US14934923Application Date: 2015-11-06
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Publication No.: US10510518B2Publication Date: 2019-12-17
- Inventor: Kwangduk Douglas Lee , Sudha Rathi , Ramprakash Sankarakrishnan , Martin Jay Seamons , Irfan Jamil , Bok Hoen Kim
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson+Sheridan LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01J37/32 ; G03F7/42 ; H01L21/311 ; B08B7/00

Abstract:
Embodiments of the invention generally relate to methods of dry stripping boron-carbon films. In one embodiment, alternating plasmas of hydrogen and oxygen are used to remove a boron-carbon film. In another embodiment, co-flowed oxygen and hydrogen plasma is used to remove a boron-carbon containing film. A nitrous oxide plasma may be used in addition to or as an alternative to either of the above oxygen plasmas. In another embodiment, a plasma generated from water vapor is used to remove a boron-carbon film. The boron-carbon removal processes may also include an optional polymer removal process prior to removal of the boron-carbon films. The polymer removal process includes exposing the boron-carbon film to NF3 to remove from the surface of the boron-carbon film any carbon-based polymers generated during a substrate etching process.
Public/Granted literature
- US20160064209A1 METHODS OF DRY STRIPPING BORON-CARBON FILMS Public/Granted day:2016-03-03
Information query
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