- 专利标题: Color filter substrate and method of fabricating a color filter substrate
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申请号: US15744978申请日: 2017-03-17
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公开(公告)号: US10527881B2公开(公告)日: 2020-01-07
- 发明人: Chengpeng Yao , Huan Ni , Xinxia Zhang , Xiaolong Xie , Qun Li , Xiao Guo
- 申请人: BOE TECHNOLOGY GROUP CO., LTD. , HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 申请人地址: CN Beijing CN Hefei, Anhui
- 专利权人: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 当前专利权人: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 当前专利权人地址: CN Beijing CN Hefei, Anhui
- 代理机构: Intellectual Valley Law, P.C.
- 国际申请: PCT/CN2017/077060 WO 20170317
- 国际公布: WO2018/165975 WO 20180920
- 主分类号: G02B5/20
- IPC分类号: G02B5/20 ; G02F1/1335 ; G03F7/00
摘要:
The present application discloses a method of fabricating a color filter substrate, including forming a black matrix layer including forming a plurality of black matrices on a base substrate thereby defining a plurality of subpixel areas, the plurality of black matrices being formed to have a plurality of pores; dispensing a first color filter material in a plurality of first subpixel areas of the plurality of subpixel areas thereby forming a first color filter material layer, the first color filter material permeating into pores of black matrices adjacent to the plurality of first subpixel areas; and forming a first color filter layer. Subsequent to forming the first color filter layer, the first color filter material remains in at least a first portion of the black matrices adjacent to the plurality of first subpixel areas.
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