Invention Grant
- Patent Title: Particle beam treatment system
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Application No.: US15448685Application Date: 2017-03-03
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Publication No.: US10532227B2Publication Date: 2020-01-14
- Inventor: Kenichi Takizawa , Tomoki Murata
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2016-042740 20160304
- Main IPC: A61N5/10
- IPC: A61N5/10

Abstract:
There is provided a particle beam treatment system which has a simple mechanism and which is excellent in maintainability. Irradiation devices 10a and 10b respectively have a plurality of irradiation ports 102a, 102b, and 102c for irradiating a target with a particle beam in a plurality of directions. In addition, an irradiation nozzle unit 105 of the irradiation devices 10a and 10b is movable between the plurality of irradiation ports 102a, 102b, and 102c. A fixed cover structure 107 is disposed between the plurality of irradiation ports 102a, 102b, and 102c and the irradiation nozzle unit 105. In addition, the cover structure 107 has a slit 110 for allowing the irradiation nozzle unit 105 to move therethrough.
Public/Granted literature
- US20170252581A1 PARTICLE BEAM TREATMENT SYSTEM Public/Granted day:2017-09-07
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