Invention Grant
- Patent Title: Lithography apparatus and a method of manufacturing a device
-
Application No.: US16477955Application Date: 2017-12-04
-
Publication No.: US10534271B2Publication Date: 2020-01-14
- Inventor: Pieter Jeroen Johan Emanuel Hoefnagels , Ronald Frank Kox , John Maria Bombeeck , Johannes Cornelis Paulus Melman , Ruud Hendrikus Martinus Johannes Bloks , Patricius Jacobus Neefs
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP17153339 20170126
- International Application: PCT/EP2017/081345 WO 20171204
- International Announcement: WO2018/137816 WO 20180802
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20

Abstract:
A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.
Public/Granted literature
- US20190361357A1 LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE Public/Granted day:2019-11-28
Information query