Invention Grant
- Patent Title: Integrated circuit devices including fin shapes
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Application No.: US15866039Application Date: 2018-01-09
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Publication No.: US10535666B2Publication Date: 2020-01-14
- Inventor: Jae-yup Chung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2015-0029864 20150303
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L27/02 ; H01L29/06 ; H01L29/78

Abstract:
Integrated circuit devices are provided. An integrated circuit device includes a substrate having first and second fin-shaped Field Effect Transistor (FinFET) bodies protruding from the substrate. The first and second FinFET bodies have different respective first and second shapes in a first region and a second region, respectively, of the integrated circuit device.
Public/Granted literature
- US20180130808A1 INTEGRATED CIRCUIT DEVICES INCLUDING FIN SHAPES Public/Granted day:2018-05-10
Information query
IPC分类: