Invention Grant
- Patent Title: Semiconductor device with low lifetime region
-
Application No.: US15961568Application Date: 2018-04-24
-
Publication No.: US10535729B2Publication Date: 2020-01-14
- Inventor: Mitsuhiro Kakefu
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: Rabin & Berdo, P.C.
- Priority: JP2012-271031 20121212; JP2013-230902 20131107
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/32 ; H01L29/861 ; H01L29/10

Abstract:
In a semiconductor device including a low lifetime region of a depth within a range on both sides sandwiching a p-n junction of a p-type semiconductor region bottom portion, the low lifetime region includes a central region that has a portion coinciding with the semiconductor region as seen from one main surface side and is selectively formed as far as the position of a contact end portion of a region of the coinciding portion with which the semiconductor region and a metal electrode are in contact, a peripheral region wherein the central region extends as far as the position of an outer peripheral end of the semiconductor region, and an expanded end portion region wherein the peripheral region extends as far as an outer peripheral end of the innermost of guard rings. Because of this, it is possible to reduce leakage current while maintaining high reverse recovery current resistance.
Public/Granted literature
- US20180240866A1 SEMICONDUCTOR DEVICE WITH LOW LIFETIME REGION Public/Granted day:2018-08-23
Information query
IPC分类: