- 专利标题： Method for producing cyclometalated iridium complex, and cyclometalated iridium complex precursor including organoiridium material
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申请号： US16331978申请日： 2017-10-12
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公开(公告)号： US10538543B2公开(公告)日： 2020-01-21
- 发明人: Hideo Konno , Junichi Taniuchi , Rumi Kobayashi , Yasushi Masahiro
- 申请人： NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY , TANAKA KIKINZOKU KOGYO K.K.
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY,TANAKA KIKINZOKU KOGYO K.K.
- 当前专利权人： NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY,TANAKA KIKINZOKU KOGYO K.K.
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Foley & Lardner LLP
- 优先权： JP2016-207483 20161024
- 国际申请： PCT/JP2017/036935 WO 20171012
- 国际公布： WO2018/079275 WO 20180503
- 主分类号： C07F15/00
- IPC分类号： C07F15/00
摘要：
The present invention provides a method for producing a cyclometalated iridium complex, the method including producing a cyclometalated iridium complex by reacting a cyclometalated iridium complex raw material including an organoiridium material with an aromatic heterocyclic bidentate ligand capable of forming an iridium-carbon bond and an iridium-nitrogen bond, and using as the raw material an organoiridium material represented by the following general formula (1). The present invention allows a cyclometalated iridium complex to be produced with a high yield without by-production of a halogen-crosslinked iridium dimer.
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