Invention Grant
- Patent Title: Seal ring structure of integrated circuit and method of forming same
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Application No.: US15690398Application Date: 2017-08-30
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Publication No.: US10546822B2Publication Date: 2020-01-28
- Inventor: Nicholas A. Polomoff , Vincent J. McGahay
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Hoffman Warnick LLC
- Agent Anthony Canale
- Main IPC: H01L21/70
- IPC: H01L21/70 ; H01L23/58 ; H01L21/768 ; H01L23/00

Abstract:
A seal ring structure of an integrated circuit including a first discontinuous seal wall circumscribing a first portion of the integrated circuit, the first seal wall forming a first pattern on a substrate, and a second discontinuous seal wall circumscribing a second portion of the integrated circuit, the second seal wall forming a second pattern on the substrate and the second portion being at least partially offset from the first portion, wherein the first pattern of the first seal wall interlocks with the second pattern of the second seal wall such that the patterns are interweaved without intersecting, wherein a space is formed between the seal walls, the space creating a non-linear path to the integrated circuit, and wherein the seal ring structure fully circumscribes the integrated circuit. A method of forming such a seal ring structure is also disclosed.
Public/Granted literature
- US20190067210A1 SEAL RING STRUCTURE OF INTEGRATED CIRCUIT AND METHOD OF FORMING SAME Public/Granted day:2019-02-28
Information query
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