Invention Grant
- Patent Title: Torque pattern adjustment apparatus and method for adjusting torque pattern using the same
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Application No.: US14610731Application Date: 2015-01-30
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Publication No.: US10548799B2Publication Date: 2020-02-04
- Inventor: Keehong Seo , Byung-Kwon Choi , Bokman Lim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2014-0115274 20140901
- Main IPC: A61H3/00
- IPC: A61H3/00 ; B25J9/00

Abstract:
An torque pattern adjustment apparatus including a display configured to display a first torque pattern corresponding to a gait cycle, and a generator configured to generate a second torque pattern by adjusting at least a portion of the first torque pattern in response to a reception of an input, and a torque pattern adjustment method using the same may be provided. The first torque pattern may be applied to a joint of a user.
Public/Granted literature
- US20160058646A1 TORQUE PATTERN ADJUSTMENT APPARATUS AND METHOD FOR ADJUSTING TORQUE PATTERN USING THE SAME Public/Granted day:2016-03-03
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