Invention Grant
- Patent Title: Proximity sensor, lithographic apparatus and device manufacturing method
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Application No.: US15769999Application Date: 2016-10-25
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Publication No.: US10551182B2Publication Date: 2020-02-04
- Inventor: Tiannan Guan , Joseph Eid Estafanous Zekry
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Priority: EP15193776 20151110
- International Application: PCT/EP2016/075670 WO 20161025
- International Announcement: WO2017/080818 WO 20170518
- Main IPC: G01B13/12
- IPC: G01B13/12 ; G03F9/00 ; G01L11/02

Abstract:
A gas gauge proximity sensor comprising a measurement gas flow channel having an optical pressure sensor for comparing a pressure of the first gas flow and a reference pressure; the optical pressure sensor comprising a first optical cavity fluidly connected to the measurement channel and a second optical cavity fluidly connected to the reference pressure, with the optical cavities being configured to receive electromagnetic radiation and output reflected electromagnetic radiation, the optical pressure sensor further being configured to combine the reflected electromagnetic radiation from the first optical cavity with the reflected electromagnetic radiation from the second optical cavity and determine, based on the combined electromagnetic radiation, a pressure difference between the pressure of the first gas flow and the reference pressure and determine, based on the pressure difference, a distance between the measurement outlet and the measurement object.
Public/Granted literature
- US20190086202A1 PROXIMITY SENSOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2019-03-21
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