Invention Grant
- Patent Title: Lithographic apparatus and method
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Application No.: US15774165Application Date: 2016-11-01
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Publication No.: US10551746B2Publication Date: 2020-02-04
- Inventor: Benjamin Cunnegonda Henricus Smeets , Mark Constant Johannes Baggen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Priority: EP15195517 20151120
- International Application: PCT/EP2016/076274 WO 20161101
- International Announcement: WO2017/084870 WO 20170526
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the substrate table or the projection system.
Public/Granted literature
- US20180321593A1 LITHOGRAPHIC APPARATUS AND METHOD Public/Granted day:2018-11-08
Information query
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