Invention Grant
- Patent Title: Array substrate with via holes having gradually decreased areas, photomask for manufacturing array substrate, and display device comprising array substrate
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Application No.: US15539810Application Date: 2017-05-25
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Publication No.: US10553615B2Publication Date: 2020-02-04
- Inventor: Kaixiang Zhao
- Applicant: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Wuhan
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
- Current Assignee Address: CN Wuhan
- Priority: CN201710280444 20170426
- International Application: PCT/CN2017/085840 WO 20170525
- International Announcement: WO2018/196072 WO 20181101
- Main IPC: H01L27/12
- IPC: H01L27/12 ; G06F3/047 ; G02F1/1362 ; G06F3/041 ; G03F1/00 ; H01L29/786

Abstract:
Provided is an array substrate, a photomask, and a display device. The array substrate includes a substrate, a common electrode layer on which a plurality of first via holes are provided at predetermined positions, a passivation layer having a plurality of second via holes disposed concentrically with the first via holes, and a pixel electrode layer having a plurality of pixel electrodes. Areas of the first via holes are configured to gradually decrease in the direction from an output proximal end to an output distal end of a gate line.
Public/Granted literature
- US20180358382A1 ARRAY SUBSTRATE, PHOTOMASK, AND DISPLAY DEVICE Public/Granted day:2018-12-13
Information query
IPC分类: