Invention Grant
- Patent Title: Method and system for providing magnetic junctions utilizing metal oxide layer(s)
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Application No.: US15787524Application Date: 2017-10-18
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Publication No.: US10553642B2Publication Date: 2020-02-04
- Inventor: Don Koun Lee , Mohamad Towfik Krounbi , Xueti Tang , Gen Feng , Ikhtiar
- Applicant: Samsung Electronics Co., LTD.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Van Pelt, Yi & James LLP
- Main IPC: H01L43/02
- IPC: H01L43/02 ; H01L43/08 ; H01L43/10 ; H01L43/12 ; H01L27/22 ; G11B5/39 ; G11C11/16

Abstract:
A magnetic junction, a memory using the magnetic junction and method for providing the magnetic junction are described. The magnetic junction resides on a substrate and is usable in a magnetic device. The magnetic junction includes a reference layer, a nonmagnetic spacer layer and a M-containing oxide layer adjacent to the free layer. M includes at least one of Ti, Al, Hf, Zr, Mo, V and Nb. The free layer is switchable between a plurality of stable magnetic states when a write current is passed through the magnetic junction. The nonmagnetic spacer layer is between the reference layer and the free layer. The free layer is between the nonmagnetic spacer layer and the M-containing oxide layer.
Public/Granted literature
- US20190067366A1 METHOD AND SYSTEM FOR PROVIDING MAGNETIC JUNCTIONS UTILIZING METAL OXIDE LAYER(S) Public/Granted day:2019-02-28
Information query
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