Systems, methods and an apparatus used for delivery of chemical precursors, and more particularly to an ampoule for containing chemical precursors are provided. In one implementation, an apparatus for generating a chemical precursor used in a vapor deposition processing system is provided. The apparatus comprises a canister comprising a sidewall, a top, and a bottom surface encompassing an interior volume therein, an adhesion layer disposed over an outside surface of the sidewall and bottom surface, a thermally conductive coating disposed over the adhesion layer, an insulator layer disposed over the thermally conductive coating, wherein the thermally conductive coating over the bottom surface remains exposed and an inlet port and an outlet port in fluid communication with the interior volume.