Invention Grant
- Patent Title: Polarization independent metrology system
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Application No.: US16389208Application Date: 2019-04-19
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Publication No.: US10558131B2Publication Date: 2020-02-11
- Inventor: Krishanu Shome , Justin Lloyd Kreuzer
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20

Abstract:
A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector. Additionally, an optical rotator can be configured to receive the first polarized light and rotate the polarization of the first polarized light.
Public/Granted literature
- US20190243254A1 Polarization Independent Metrology System Public/Granted day:2019-08-08
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