Invention Grant
- Patent Title: Method of determining an optimal focus height for a metrology apparatus
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Application No.: US16253338Application Date: 2019-01-22
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Publication No.: US10571363B2Publication Date: 2020-02-25
- Inventor: Mariya Vyacheslavivna Medvedyeva , Anagnostis Tsiatmas , Hugo Augustinus Joseph Cramer , Martinus Hubertus Maria Van Weert , Bastiaan Onne Fagginger Auer , Xiaoxin Shang , Johan Maria Van Boxmeer , Bert Verstraeten
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP18154864 20180202
- Main IPC: G01M11/02
- IPC: G01M11/02 ; G03F7/20 ; G02B7/38

Abstract:
Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.
Public/Granted literature
- US20190242782A1 METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPARATUS Public/Granted day:2019-08-08
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