- 专利标题： Substrate processing apparatus including annular lamp assembly
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申请号： US15402142申请日： 2017-01-09
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公开(公告)号： US10573498B2公开(公告)日： 2020-02-25
- 发明人: Bharath Swaminathan , Hanbing Wu , John Mazzocco
- 申请人： APPLIED MATERIALS, INC.
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Moser Taboada
- 代理商 Alan Taboada
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; H01L21/469 ; H01J37/32 ; H01L21/687 ; C23C14/34 ; C23C14/50 ; H01J37/34
摘要：
Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate support includes a substrate support pedestal having an upper surface to support a substrate and an opposing bottom surface, wherein the substrate support pedestal is formed of a material that is transparent to radiation; a lamp assembly disposed below the substrate support pedestal and having a plurality of lamps configured to heat the substrate; a pedestal support extending through the lamp assembly to support the substrate support pedestal in a spaced apart relation to the plurality of lamps; a shaft coupled to a second end of the pedestal support opposite the first end; and a rotation assembly coupled to the shaft opposite the pedestal support to rotate the shaft, the pedestal support, and the substrate support pedestal with respect to the lamp assembly.
公开/授权文献
- US20180197721A1 METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE 公开/授权日：2018-07-12
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