Invention Grant
- Patent Title: Support apparatus, lithographic apparatus and device manufacturing method
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Application No.: US15567279Application Date: 2016-03-22
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Publication No.: US10578959B2Publication Date: 2020-03-03
- Inventor: Gijs Kramer , Simon Karel Ravensbergen , Niek Jacobus Johannes Roset , Pieter Renaat Maria Hennus
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP15165563 20150429
- International Application: PCT/EP2016/056235 WO 20160322
- International Announcement: WO2016/173779 WO 20161103
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20

Abstract:
A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.
Public/Granted literature
- US20180107107A1 SUPPORT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2018-04-19
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