- Patent Title: Alternative target design for metrology using modulation techniques
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Application No.: US16063190Application Date: 2016-12-13
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Publication No.: US10585357B2Publication Date: 2020-03-10
- Inventor: Maurits Van Der Schaar , Youping Zhang , Hua Xu
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2016/080742 WO 20161213
- International Announcement: WO2017/114652 WO 20170706
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G03F7/20 ; G03F9/00

Abstract:
A target structure, wherein the target structure is configured to be measured with a metrology tool that has a diffraction threshold; the target structure including: one or more patterns supported on a substrate, the one or more patterns being periodic with a first period in a first direction and periodic with a second period in a second direction, wherein the first direction and second direction are different and parallel to the substrate, and the first period is equal to or greater than the diffraction threshold and the second period is less than the diffraction threshold.
Public/Granted literature
- US20180373168A1 ALTERNATIVE TARGET DESIGN FOR METROLOGY USING MODULATION TECHNIQUES Public/Granted day:2018-12-27
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