Die resistance-capacitance extraction and validation
Abstract:
Systems and methods for die resistance-capacitance (RC) extraction and validation are described. In one embodiment, the method includes generating a chip power model (CPM) based at least in part on single domain excitation to determine a die capacitance; and performing loop-based static IR drop analysis to determine a die resistance for each power domain of a die. In some cases, the generating of the chip power model (CPM) includes generating a separate CPM for each power domain of the die.
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