Invention Grant
- Patent Title: Gas supply apparatus with improved control
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Application No.: US12161793Application Date: 2007-01-24
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Publication No.: US10596335B2Publication Date: 2020-03-24
- Inventor: Andrew Michael Chapman , Bruce William Potter
- Applicant: Andrew Michael Chapman , Bruce William Potter
- Applicant Address: NZ Auckland
- Assignee: DEVX Tech IP Limited
- Current Assignee: DEVX Tech IP Limited
- Current Assignee Address: NZ Auckland
- Agency: Haynes and Boone LLP
- Priority: NZ552009 20060124
- International Application: PCT/NZ2007/000021 WO 20070124
- International Announcement: WO2007/086766 WO 20070802
- Main IPC: A61M16/00
- IPC: A61M16/00

Abstract:
A gas supply apparatus with improved control is provided. The gas supply apparatus provides gas at an outlet junction. The apparatus includes a gas mixer for gasses from primary and secondary supplies to a given ratio. The apparatus also includes a gas reservoir supplied by the gas mixer. A tertiary supply valve is also included and connected in parallel with the reservoir. The tertiary supply valve is adapted to connect the outlet junction to a tertiary gas supply when gas is not being supplied to a mixer by the primary and/or secondary supply.
Public/Granted literature
- US20100297593A1 Gas Supply Apparatus With Improved Control Public/Granted day:2010-11-25
Information query
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