Invention Grant
- Patent Title: Antireflective stack for low luminance conditions
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Application No.: US15540224Application Date: 2015-12-30
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Publication No.: US10605959B2Publication Date: 2020-03-31
- Inventor: Yu Liu , Xingzhao Ding
- Applicant: ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE)
- Applicant Address: FR Charenton-le-Pont
- Assignee: Essilor International
- Current Assignee: Essilor International
- Current Assignee Address: FR Charenton-le-Pont
- Agency: Norton Rose Fulbright US LLP
- Priority: EP14307226 20141231
- International Application: PCT/EP2015/081447 WO 20151230
- International Announcement: WO2016/107916 WO 20160707
- Main IPC: G02B1/115
- IPC: G02B1/115 ; C03C17/34 ; G02B27/00 ; G02C7/02
Abstract:
Ophthalmic lens comprising an anti-reflective stack designed for scotopic or mesopic conditions, wherein the anti-reflective stack design method uses the scotopic luminosity function CIE 1951 (defined by the Commission Internationale de I'Eclairage).
Public/Granted literature
- US20190056530A1 Antireflective Stack for Low Luminance Conditions Public/Granted day:2019-02-21
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