Invention Grant
- Patent Title: Spalling techniques for manufacturing photodiodes
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Application No.: US15787174Application Date: 2017-10-18
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Publication No.: US10658531B2Publication Date: 2020-05-19
- Inventor: Stephen W. Bedell , James R. Kozloski , Devendra K. Sadana
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/0304 ; H01L31/18 ; H01L31/107 ; G01T1/00 ; H01L31/115

Abstract:
A photodiode fabricated using spalling techniques, and method for making the same. The photodiode including a substrate, an optical device semiconductor material layer disposed over the substrate, a p-type contact disposed over the optical device semiconductor material layer, an n-type contact disposed over the substrate, and an adhesion layer for rear illumination adhered to the bottom of the substrate. Both the substrate and the optical device semiconductor material layer comprise at least one of GaN, AlGaN or AlN.
Public/Granted literature
- US20190115485A1 SPALLING TECHNIQUES FOR MANUFACTURING PHOTODIODES Public/Granted day:2019-04-18
Information query
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