- 专利标题: Edge-firing antenna walls built into substrate
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申请号: US16021474申请日: 2018-06-28
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公开(公告)号: US10658765B2公开(公告)日: 2020-05-19
- 发明人: Sri Chaitra Jyotsna Chavali , Sanka Ganesan , William J. Lambert , Debendra Mallik , Zhichao Zhang
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Schwegman Lundberg & Woessner, P.A.
- 主分类号: H01Q1/38
- IPC分类号: H01Q1/38 ; H01Q25/00 ; H01Q9/04
摘要:
A method of forming a planar antenna on a first substrate. An antenna feedline is formed on a peelable copper film of a carrier. A dielectric with no internal conductive layer is formed on the feedline. A planar antenna is formed on one of two parallel sides of the dielectric and a feed port is formed adjacent the other parallel side. The feedline connects the antenna with the feed port. One plane of the planar antenna is configured for perpendicular attachment to a second substrate. The feedline is connected to the planar antenna by a via through the dielectric. The peelable copper is removed and the structure is etched to produce the planar antenna on the substrate. Two planar antennas on substrates can be perpendicularly attached to another substrate to form side-firing antennas.
公开/授权文献
- US20200006866A1 EDGE-FIRING ANTENNA WALLS BUILT INTO SUBSTRATE 公开/授权日:2020-01-02
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