- 专利标题: Reticle stage and method for using the same
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申请号: US16359073申请日: 2019-03-20
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公开(公告)号: US10663871B2公开(公告)日: 2020-05-26
- 发明人: Chia-Yu Lee , Tao-Hsin Chen , Chia-Hao Hsu , Ching-Juinn Huang , Po-Chung Cheng
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: McClure, Qualey & Rodack, LLP
- 主分类号: G03B27/62
- IPC分类号: G03B27/62 ; G03F7/20
摘要:
A reticle stage is provided, including an electrostatic chuck and an acoustic wave transducer. The electrostatic chuck includes multiple chucking electrodes embedded in a dielectric body and configured to secure a reticle to a chuck surface of the dielectric body by electrostatic attraction. The acoustic wave transducer is disposed on the chuck surface and configured to impart a surface acoustic wave to the chuck surface to vibrate the chuck surface, thereby removing the reticle from the reticle stage.
公开/授权文献
- US20200033717A1 RETICLE STAGE AND METHOD FOR USING THE SAME 公开/授权日:2020-01-30
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