Invention Grant
- Patent Title: Measurement systems, lithographic apparatus, device manufacturing method and a method of measuring
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Application No.: US15738695Application Date: 2016-05-31
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Publication No.: US10678147B2Publication Date: 2020-06-09
- Inventor: Stoyan Nihtianov
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@16c84fc
- International Application: PCT/EP2016/062207 WO 20160531
- International Announcement: WO2017/005408 WO 20170112
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N27/90 ; G01D5/20 ; G01B7/02

Abstract:
A measurement system for measuring a position and/or displacement of an object (40), the measurement system comprising a sensor (20) and a target (45), the sensor comprising an electromagnet (21); a driving circuit (24) configured to drive the electromagnet to generate an alternating magnetic field (AMF); a measuring circuit (25) configured to measure an electrical impedance parameter of the electromagnet; the target being located on a surface (41) of the object that faces the sensor, wherein the target comprises a graphene layer (46), and wherein, in use, when the alternating magnetic field interacts with the target, the alternating magnetic field changes (RMF), altering the electrical impedance parameter of the electromagnet.
Public/Granted literature
- US20180173115A1 Measurement Systems, Lithographic Apparatus, Device manufacturing Method and a Method of Measuring Public/Granted day:2018-06-21
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