Invention Grant
- Patent Title: Ferroelectric-based memory cell usable in on-logic chip memory
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Application No.: US16142954Application Date: 2018-09-26
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Publication No.: US10679688B2Publication Date: 2020-06-09
- Inventor: Titash Rakshit , Borna J. Obradovic , Ryan M. Hatcher , Jorge A. Kittl
- Applicant: Samsung Electronics Co., LTD.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Van Pelt, Yi & James LLP
- Main IPC: G11C11/22
- IPC: G11C11/22 ; H01L27/11585 ; H01L27/11502

Abstract:
A memory cell and method for utilizing the memory cell are described. The memory cell includes at least one ferroelectric transistor (FE-transistor) and at least one selection transistor coupled with the FE-transistor. An FE-transistor includes a transistor and a ferroelectric capacitor for storing data. The ferroelectric capacitor includes ferroelectric material(s). In some aspects, the memory cell consists of a FE-transistor and a selection transistor. In some aspects, the transistor of the FE-transistor includes a source, a drain and a gate coupled with the ferroelectric capacitor. In this aspect, the selection transistor includes a selection transistor source, a selection transistor drain and a selection transistor gate. In this aspect, a write port of the memory cell is the selection transistor source or the selection transistor drain. The other of the selection transistor source and drain is coupled to the ferroelectric capacitor.
Public/Granted literature
- US20190318775A1 FERROELECTRIC-BASED MEMORY CELL USABLE IN ON-LOGIC CHIP MEMORY Public/Granted day:2019-10-17
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