Invention Grant
- Patent Title: Marker suppressing aberration
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Application No.: US16060426Application Date: 2016-12-02
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Publication No.: US10684454B2Publication Date: 2020-06-16
- Inventor: Tomohiro Saito
- Applicant: Enplas Corporation
- Applicant Address: JP Saitama
- Assignee: ENPLAS CORPORATION
- Current Assignee: ENPLAS CORPORATION
- Current Assignee Address: JP Saitama
- Agency: Brundidge & Stanger, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7a890926
- International Application: PCT/JP2016/085847 WO 20161202
- International Announcement: WO2017/099007 WO 20170615
- Main IPC: G02B13/18
- IPC: G02B13/18 ; G02B3/00 ; G02B27/18 ; G02B3/02 ; G09F19/12 ; G02B27/60 ; G02B27/00 ; G02B27/32 ; G03B35/24

Abstract:
A marker (10) includes a lenticular lens (11) formed from a translucent material to have a plurality of convex portions (13) positioned to line up in, for example, at least one direction. The optical axes (OA1) of the convex portions (13) all intersect with an optical reference point (OP) on the product optical axis (PA). The optical axes (OA1) of the convex portions (13) are all orthogonal with and pass through the center of the bottom surfaces of grooves (14). Colored portions (15) are accommodated in the grooves (14).
Public/Granted literature
- US20180364459A1 MARKER Public/Granted day:2018-12-20
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