- Patent Title: Method and apparatus to determine a patterning process parameter
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Application No.: US16116437Application Date: 2018-08-29
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Publication No.: US10691031B2Publication Date: 2020-06-23
- Inventor: Sergey Tarabrin
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7cfb536d
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
Public/Granted literature
- US20190072862A1 METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER Public/Granted day:2019-03-07
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