Invention Grant
- Patent Title: Evaporating device and evaporating method
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Application No.: US15605859Application Date: 2017-05-25
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Publication No.: US10697055B2Publication Date: 2020-06-30
- Inventor: Jian Xu , Yaoyang Liu
- Applicant: SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD. , TIANMA MICRO-ELECTRONICS CO., LTD.
- Applicant Address: CN Shanghai CN Shenzhen
- Assignee: SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD.,TIANMA MICRO-ELECTRONICS CO., LTD.
- Current Assignee: SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD.,TIANMA MICRO-ELECTRONICS CO., LTD.
- Current Assignee Address: CN Shanghai CN Shenzhen
- Agency: Alston & Bird LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@f64fa55
- Main IPC: C23C14/24
- IPC: C23C14/24 ; C23C14/04

Abstract:
Embodiments of the present disclosure disclose an evaporating device and an evaporating method. The evaporating device comprises: a Halbach magnet array and a mask setting region. A magnetization direction of at least part of the Halbach magnet array precesses clockwise or counter-clockwise, so that magnetic fields having different magnetic fields are formed at two sides of the Halbach magnet array; and the mask setting region is disposed within the magnetic field at one side of the Halbach magnet array. The mask of the ferromagnetic material is placed in the evaporating device provided by the embodiments of the present disclosure. The mask is subject to an attractive force of the Halbach magnet array.
Public/Granted literature
- US20170260621A1 Evaporating Device And Evaporating Method Public/Granted day:2017-09-14
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