Invention Grant
- Patent Title: Nanoparticle formation mitigation in a deposition process
-
Application No.: US14920081Application Date: 2015-10-22
-
Publication No.: US10704135B2Publication Date: 2020-07-07
- Inventor: James W Neal , Brian T Hazel , David A Litton , Eric Jorzik
- Applicant: UNITED TECHNOLOGIES CORPORATION
- Applicant Address: US CT Farmington
- Assignee: Raytheon Technologies Corporation
- Current Assignee: Raytheon Technologies Corporation
- Current Assignee Address: US CT Farmington
- Agency: Bachman & LaPointe, P.C.
- Main IPC: C23C14/30
- IPC: C23C14/30 ; C23C14/56 ; C23C14/54
Abstract:
A system for depositing coating on a workpiece includes a deposition chamber within which is formed a vortex to at least partially surround a workpiece therein.
Public/Granted literature
- US20160115584A1 NANOPARTICLE FORMATION MITIGATION IN A DEPOSITION PROCESS Public/Granted day:2016-04-28
Information query
IPC分类:
