Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US16354432Application Date: 2019-03-15
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Publication No.: US10705432B2Publication Date: 2020-07-07
- Inventor: Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Public/Granted literature
- US20190212662A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2019-07-11
Information query
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