Invention Grant
- Patent Title: Asymmetric overlay mark for overlay measurement
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Application No.: US15985838Application Date: 2018-05-22
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Publication No.: US10707175B2Publication Date: 2020-07-07
- Inventor: Wei Zhao , Minghao Tang , Rui Chen , Dongyue Yang , Haiting Wang , Erik Geiss , Scott Beasor
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01L23/544
- IPC: H01L23/544

Abstract:
One illustrative example of an overlay mark disclosed herein includes four quadrants (I-IV). Each quadrant of the mark contains an inner periodic structure and an outer periodic structure. Each of the outer periodic structures includes a plurality of outer features. Each of the inner periodic structures includes a plurality of first inner groups, each of the first inner groups having a plurality of first inner features, each first inner group being oriented such that there is an end-to-end spacing relationship between each first inner group and a selected one of the outer features.
Public/Granted literature
- US20190363053A1 ASYMMETRIC OVERLAY MARK FOR OVERLAY MEASUREMENT Public/Granted day:2019-11-28
Information query
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