Invention Grant
- Patent Title: Method and device for focusing in an inspection system
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Application No.: US15683473Application Date: 2017-08-22
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Publication No.: US10724961B2Publication Date: 2020-07-28
- Inventor: Yevgeniy Konstantinovich Shmarev , Stanislav Smirnov
- Applicant: ASML HOLDING N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01N21/21 ; G01N21/95 ; G03F7/207 ; G03F7/20

Abstract:
An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.
Public/Granted literature
- US20180067057A1 METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM Public/Granted day:2018-03-08
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