- 专利标题: RF switches, integrated circuits, and devices with multi-gate field effect transistors and voltage leveling circuits, and methods of their fabrication
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申请号: US16398811申请日: 2019-04-30
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公开(公告)号: US10734516B2公开(公告)日: 2020-08-04
- 发明人: Venkata Naga Koushik Malladi
- 申请人: NXP USA, Inc.
- 申请人地址: US TX Austin
- 专利权人: NXP USA, Inc.
- 当前专利权人: NXP USA, Inc.
- 当前专利权人地址: US TX Austin
- 代理商 Sherry W. Schumm
- 主分类号: H01L21/8234
- IPC分类号: H01L21/8234 ; H01L29/78 ; H04B1/48 ; H01L27/07 ; H01L29/66 ; H01L27/02 ; H01L23/66 ; H01L27/06 ; H01L49/02 ; H03K17/22 ; H01L29/786 ; H04B1/44
摘要:
Embodiments of field effect transistor (FET) circuits, RF switches, and devices include source and drain terminals coupled to an active surface of a semiconductor substrate, a channel in the substrate between the source and drain terminals, and a plurality of gate structures coupled to the active surface over the channel. A channel contact is coupled to the active surface over the channel between a first pair of the gate structures, and a first capacitor is electrically coupled between the channel contact and a gate structure of the plurality of gate structures.
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