Invention Grant
- Patent Title: Mask plate, display substrate, method for manufacturing display substrate, and display device
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Application No.: US16134521Application Date: 2018-09-18
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Publication No.: US10739930B2Publication Date: 2020-08-11
- Inventor: Haifeng Hu , Ming Zhang , Xianlin Ding , Weijie Ma , Huan Liu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Anhui
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Anhui
- Agency: Westman, Champlin & Koehler, P.A.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@db1e8a0
- Main IPC: G06F3/047
- IPC: G06F3/047 ; G06F3/041 ; G06F3/044 ; H01L21/027 ; G03F7/20

Abstract:
A method for manufacturing a display substrate includes: providing a substrate; forming a film layer and a photoresist layer to be patterned on the substrate; exposing and developing the photoresist layer to form a photoresist pattern including a first photoresist pattern and a second photoresist pattern, the first photoresist pattern corresponding to a film layer pattern to be formed, and the second photoresist pattern being located on at least two opposite sides of the first photoresist pattern, and spaced apart from the first photoresist pattern; wet-etching the film layer to be patterned so that a film layer between the first photoresist pattern and the second photoresist pattern is etched, a film layer under the second photoresist pattern being detached from the substrate, and a film layer under the first photoresist pattern forming the film layer pattern.
Public/Granted literature
- US20190235669A1 MASK PLATE, DISPLAY SUBSTRATE, METHOD FOR MANUFACTURING DISPLAY SUBSTRATE, AND DISPLAY DEVICE Public/Granted day:2019-08-01
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